Si2 announced that Cadence has donated extensions to the OpenAccess community which enable physical design tools to represent Multi-Patterned Technology (MPT). Conventional photolithography cannot ...

The Tata-ASML partnership gives India a “scalable lithography foundation” that could eventually support manufacturing beyond ...

OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton, Inc. , a major lithography light source manufacturer, announced that the company will begin shipping the GT63A, the next-generation ArF excimer laser for ...

Lithography scanner light source provider demonstrates capability for the future generation of larger wafers. OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton Inc., a major lithography light source ...

Researchers, equipment vendors, and manufacturers alike are watching with growing concern as we creep every closer to the end of 193 nm optical lithography. The problem is not that there are no ...

With the ongoing US-China tensions, Huawei exemplified its ability to make 7nm chips without EUV equipment, and chip guru Burn Lin believes it's not surprising for Huawei to achieve the milestone, but ...

To avoid the need for multi-patterning in 1.4nm and 1nm processes, High-NA EUV will be needed, says imec. “For A14 and A10 logic nodes, requirements for the most critical metal layers (i.e., M0 and M2 ...

Semiconductor Engineering sat down to discuss lithography and photomask trends with Bryan Kasprowicz, director of technology and strategy and a distinguished member of the technical staff at ...

Experts at the Table: As leading-edge lithography nodes push further into EUV and beyond, mask-making has become one of the most critical and costly aspects of semiconductor manufacturing. At the same ...

Introduction of the breakthrough "s" series features, extending DUV light source performance, enhancing availability and reducing operating costs. SPIE Advanced Lithography 2012 - OYAMA, ...